We can provide value and satisfaction
to customers, based on Electron Beam
Lithography technology.
Crestec Corporation has established in Tokyo 1995. We delivered EB Lithography System more than 50 customers all of the world. We provide EB foundry service too. We can make fine controlled pitch L/S patterns for DFB-LD. CABL-9000C model is the best seller of DFB-LD market.
There is less forwardscatter of EB resist due to higher acceleration voltage.
CABL-UH model has more accuracy less than 10nm.
It is the best model for production of DFB-Laser diode for optical communication devices and for Academic and R&D as well. We realize high resolution and high throughput with 50kV.
We provide EB Lithography System to Universities and
research institutes for R&D purpose,
and private companies for production use too.